| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method and a device for precisely measuring an X-ray nano beam intensity distribution adapted to the measurement of an X-ray having a different wavelength by using one knife edge, and capable of performing optimum measurement corresponding to a focal depth of an X-ray beam or a condition of the other measuring device, concerning a dark field measuring method performing highly accurate measurement of an X-ray beam profile by utilizing a diffraction X-ray and a transmission X-ray by using the knife edge. <P>SOLUTION: The knife edge 4 is manufactured by changing continuously or stepwise a thickness in the longitudinal direction by a heavy metal having a function for advancing the phase of an X-ray transmitted therethrough, and set to cross the X-ray beam at a thickness position capable of obtaining a phase shift in a range that the transmission X-ray and the diffraction X-ray diffracted by the tip of the knife edge are reinforce with each other, and an X-ray wherein the diffraction X-ray and the transmission X-ray are superimposed on each other is measured by an X-ray detector. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
