| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition, from which a first resist pattern, in a double patterning process, hardly influenced by the second patterning is formed, and to provide a method for forming a resist pattern by using the positive resist composition. <P>SOLUTION: The positive resist composition to be used for forming a first resist film in a double pattering process contains: a base component (A) the solubility of which with an alkali developing solution is increased by an action of an acid; an acid generator component (B) generating an acid by exposure; and a fluorine-containing compound component (F). The component (F) contains at least one fluorine-containing resin component selected from a group consisting of fluorine-containing polymer compounds (F1) having only a structural unit (f1) including a base-dissociable group, and fluorine-containing polymer compounds (F2) having the above structural unit (f1) and a structural unit (f2) derived from an acrylate including a specified group in a side chain. <P>COPYRIGHT: (C)2010,JPO&INPIT |
