发明名称 |
Dynamic Film Thickness Control System/Method and its Utilization |
摘要 |
A dynamic film thickness control system/method and its utilization consisting of a minimum of one mask plate arranged between a substrate and a vapor source. A film thickness control device is utilized for real-time control over deposited film thickness and gradually moves the mask plate according to the film thickness control value acquired by the film thickness control device, enabling the mask plate to mask film zones on the said substrate to achieve the film thickness of a design objective. When the required zones of deposition are masked, the deposition of a particular film layer is completed.
|
申请公布号 |
US2010224127(A1) |
申请公布日期 |
2010.09.09 |
申请号 |
US20080212434 |
申请日期 |
2008.09.17 |
申请人 |
LING KOW-JE;JUANG JIUNN-SHIUH |
发明人 |
LING KOW-JE;JUANG JIUNN-SHIUH |
分类号 |
C23C16/52;C23C14/54;C23C16/00;G01B11/02;G01B11/06;G01B15/02 |
主分类号 |
C23C16/52 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|