发明名称 PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE MATERIAL
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive lithographic printing plate material which has excellent resistance to wear, prevents print contamination to be caused by scratches and fingerprints on the surface of the hydrophilic layer, and is improved in the adaptability of a cleaner liquid, with respect to the water-developable photosensitive lithographic printing plate material in which a hydrophilic layer and a photopolymerizable photosensitive layer are layered in this order on a plastic film substrate. <P>SOLUTION: The photosensitive lithographic printing plate material includes a hydrophilic layer and a photopolymerizable photosensitive layer containing a water-soluble polymer, successively formed on a plastic film substrate, wherein the hydrophilic layer contains silicone-based organic fine particles and water glass. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010197651(A) 申请公布日期 2010.09.09
申请号 JP20090041867 申请日期 2009.02.25
申请人 MITSUBISHI PAPER MILLS LTD 发明人 FURUKAWA AKIRA
分类号 G03F7/11;G03F7/00;G03F7/029;G03F7/031;G03F7/09 主分类号 G03F7/11
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