发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor achieving a highly efficient thin-film polycrystalline silicon (Si) solar cell on a glass substrate. Ž<P>SOLUTION: The method of manufacturing a semiconductor for a solar cell includes: the steps for forming on the glass a large grain size polycrystalline silicon (Si) thin film subjected to orientation control to (110) and (111) by using a solid continuous wave laser excited by semiconductor (excited by diode), and directly growing the polycrystalline silicon Si layer while using the above Si film as a seed crystal. After that, this thin film is irradiated with an energy beam in condition that the Si layer is not molten and Si is grown in solid phase. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010199524(A) 申请公布日期 2010.09.09
申请号 JP20090063516 申请日期 2009.02.20
申请人 HARA AKITO 发明人 HARA AKITO
分类号 H01L21/20;H01L31/04 主分类号 H01L21/20
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