发明名称 SEMICONDUCTOR ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor element having an excellent characteristic. SOLUTION: The semiconductor element includes: an electron running layer formed of AlxGayIn1-x-yN (0≤x≤1, 0≤y≤1, 0≤1-x-y≤1) of a thickness below a critical film thickness with respect to at least AlN, or SiC of a thickness below a critical film thickness with respect to at least AlN on AlN formed on an AlN substrate or SiC substrate or formed on a GaN substrate; and an AlzGa1-zN (0<z≤1) gate. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010199620(A) 申请公布日期 2010.09.09
申请号 JP20100118320 申请日期 2010.05.24
申请人 TOSHIBA CORP 发明人 KUSHIBE MITSUHIRO;FUJIMOTO HIDETOSHI
分类号 H01S5/343;H01L21/338;H01L29/778;H01L29/78;H01L29/812 主分类号 H01S5/343
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