发明名称 INDUCTION COUPLING PLASMA ANALYZER
摘要 PROBLEM TO BE SOLVED: To stably produce plasma by fixing the relative position of a plasma torch and a high-frequency induction coil at a predetermined position. SOLUTION: This induction coupling plasma analyzer includes the plasma torch 4 into which a plasma forming gas and an atomized sample are introduced and an induction coil 6 applying high-frequency voltage to the plasma torch 4. The induction coil 6 is fixed by an induction coil presser 11 equipped with a cavity permitting the plasma torch 4 to pass. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010197080(A) 申请公布日期 2010.09.09
申请号 JP20090039342 申请日期 2009.02.23
申请人 SII NANOTECHNOLOGY INC 发明人 TANABE HIDENORI;MATSUZAWA OSAMU;YABE SATORU
分类号 G01N21/73;G01N27/62 主分类号 G01N21/73
代理机构 代理人
主权项
地址