发明名称 |
Large area, homogeneous array fabrication including controlled tip loading vapor deposition |
摘要 |
Improved methods for loading arrays of tips with a material for subsequent deposition of the material from the tip to the substrate. Tip loading can be done by controlled vapor deposition which reduces the amount of non-specific material deposition onto a substrate. Improved nanoscale and microscale engineering and lithography can be achieved. Applications include better cellular studies including stem cell studies and stem cell differentiation control.
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申请公布号 |
US2010229264(A1) |
申请公布日期 |
2010.09.09 |
申请号 |
US20100656311 |
申请日期 |
2010.01.25 |
申请人 |
NANOINK, INC. |
发明人 |
AMRO NABIL A.;SANEDRIN RAYMOND |
分类号 |
G01Q60/38;G01Q70/08;G01Q70/16 |
主分类号 |
G01Q60/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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