| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a liquid immersion exposure apparatus equipped with a liquid recovering mechanism suppressed in influence from a recovered liquid. <P>SOLUTION: The exposure apparatus EX includes a liquid recovering mechanism 20 for recovering a liquid, and at least a part of a liquid contact surface contacting the recovered liquid, in the liquid recovering mechanism 20, has corrosion resistance to the liquid. <P>COPYRIGHT: (C)2010,JPO&INPIT |
