发明名称 PROJECTION OPTICAL SYSTEM, EXPOSURE DEVICE AND METHOD OF MANUFACTURING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a projection optical system, applied to a scanning type exposure device, for example, to thereby improve throughput related to scanning exposure. <P>SOLUTION: The projection optical system (PL), which forms a plurality of images of a first surface based on light from the first surface (M), includes: a positive lens group (Lp) where light from the first surface enters; a separate reflecting part 11 having a plurality of mirror elements arranged in the vicinity of a focal position of the positive lens group to individually vary in attitude, and controlling a plurality of first reflecting parts and a plurality of reflecting parts of the plurality of mirror elements to attitudes different from each other to separate the light (L1) entering from the positive lens group into a first light (L11) and a second light (L12) and reflect the first light and the second light toward the positive lens group; and an intermediate imaging optical system (GM) including a positive lens group and adapted to form a first image of the first surface based on the first light and a second image of the first surface based on the second light. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010197630(A) 申请公布日期 2010.09.09
申请号 JP20090041587 申请日期 2009.02.25
申请人 NIKON CORP 发明人 KIUCHI TORU;NARA KEI
分类号 G03F7/20;G02B17/08;H01L21/027 主分类号 G03F7/20
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