| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To manufacture a four-gradation photomask with reduced drawing times through a photolithography process. <P>SOLUTION: The four-gradation photomask has a light shielding part 13, a transmission part 14, and a first semi-transmission part 15A and a second semi-transmission part 15B differed in light transmission rate, and forms a resist pattern having a film thickness varied stepwise or continuously on a transfer object. The first semi-transmission part 15A is constituted by providing a semi-translucent first semi-transmission film 17A on the surface of a translucent substrate 16, the second semi-transmission part 15B is constituted by providing a semi-translucent second semi-transmission film 17B on the surface of the translucent substrate 16, the second semi-transmission part 15B being differed in light transmission rate of exposure light from the first semi-transmission part 15A. The light shielding part 13 is constituted by laminating the first semi-translucent film 17A, a light shielding film 18 and the second semi-translucent film 17B on the surface of the translucent substrate 16. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
