| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a multi-gradation photomask wherein a defect generated in a translucent part made of a translucent film is suitably corrected. <P>SOLUTION: The multi-gradation photomask has a transfer pattern having a light shielding part, a light transmitting part and a light translucent part formed on a transparent substrate, and forms a resist pattern having two or more different resist residual film values on a resist film on a body to be transferred. In the multi-gradation photomask, the light shielding part is formed by forming a light shielding film on the transparent substrate, the light transmitting part is formed by exposing the transparent substrate, the translucent part has a normal part made of the translucent film formed on the transparent substrate and a correction part made of a correction film formed on the transparent substrate, and has a phase difference with respect to wavelength light i-line to g-line in the light transmitting part and the correction part of 80°or below. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
