| 摘要 |
Provided are a semiconductor device and a method for fabricating the same. The semiconductor device may include a substrate including a cell area and a scribe lane area defining the cell area, at least one pad on the cell area, at least one through electrode penetrating the substrate and electrically connected to the at least one pad, and at least one dummy through electrode penetrating the substrate and spaced apart from the at least one through electrode. The semiconductor device may further include at least one conductive pattern on the substrate electrically connecting the at least one through electrode to the at least one dummy through electrode.
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