ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, AND PATTERN FORMING METHOD USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide an active light sensitive or a radiation sensitive resin composition which provides a fine pattern superior in exposure latitude and a pattern form, and to provide a pattern forming method using the same.

SOLUTION: The active light sensitive or the radiation sensitive resin composition contains (A) a resin that has a repeating unit including structure represented by general formula (1) and a repeating unit including structure represented by general formula (I) and increases solubility in an alkali developing solution by the action of an acid, and (B) a compound that produces an acid by active light or radiation irradiation. Wherein, codes in formulas (1) and (I) represent differential meanings.

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