| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition which provides a pattern in which various development defects such as so-called microbridge defects and BLOB defects are decreased, and to provide a method for forming a pattern using the composition. <P>SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition includes: (A) a resin having a protecting group that leaves by an action of an acid to increase the solubility with an alkali developing solution; (B) a compound generating an acid by irradiation with actinic rays or radiation; and (C) a hydrophobic resin containing at least either a fluorine atom or a silicon atom. The resin (A) includes a repeating unit having a protecting group including a polar group. The hydrophobic resin (C) contains at least one group selected from a set of (x) alkali-soluble groups, (y) groups decomposed by an action of an alkali developing solution to increase the solubility with an alkali developing solution, and (z) groups decomposed by an action of an acid to increase the solubility with an alkali developing solution. <P>COPYRIGHT: (C)2010,JPO&INPIT |
