| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate drier and a substrate drying method which are capable of successfully drying a substrate by removing a liquid attached on a substrate surface in an atmosphere at an atmospheric pressure. SOLUTION: Nitrogen gas for freeze dry having a temperature lower than the freezing-point of DIW constructing a freezing film 12 and having a dew-point lower than the temperature of the freezing film 12 is continuously supplied toward the substrate surface Wf. Consequently, the partial pressure of the water vapor in the nitrogen gas for freeze dry is lower than the vapor pressure (sublimation pressure) of the freezing film 12, whereby sublimation dry goes on. In addition, the water vapor component generated by the sublimation is removed from the substrate surface Wf together with the flow of the nitrogen gas for freeze dry, whereby the water vapor component can securely be prevented from returning to the liquid phase and the solid phase and reattaching to the substrate surface Wf. In this manner, a rinse liquid attached on the substrate surface Wf can successfully be removed in an atmosphere at an atmospheric pressure for drying the substrate W. COPYRIGHT: (C)2010,JPO&INPIT |
