| 摘要 |
The present invention relates generally to applicators and a method for reducing the concentration of unwanted chemicals, such as para-chloroaniline (PCA) from an antiseptic solution. More specifically, the applicator includes antiseptic solution in amount sufficient to be applied to a desired surface and to have an antimicrobial effect on the desired surface and a porous element. The porous element selectively removes undesired by-products from the antiseptic solution when the antiseptic solution contacts the at least one porous element.
|
