发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 An element portion forming step includes an insulating film forming step of forming an insulating film on a surface of a base layer, a conductive layer forming step of uniformly forming a conductive layer on a surface of the insulating film, and an electrode forming step of patterning the conductive layer to form an electrode. A delamination layer forming step of ion implanting a delamination material into the base layer to form a delamination layer is performed before the electrode forming step.
申请公布号 EP2226835(A1) 申请公布日期 2010.09.08
申请号 EP20080867770 申请日期 2008.11.25
申请人 SHARP KABUSHIKI KAISHA 发明人 TADA, KENSHI;TAKAFUJI, YUTAKA;FUKUSHIMA, YASUMORI;TOMIYASU, KAZUHIDE;TAKEI, MICHIKO;NAKAGAWA, KAZUO;MATSUMOTO, SHIN
分类号 H01L21/336;H01L21/02;H01L27/12;H01L29/786 主分类号 H01L21/336
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