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发明名称
ETCHING RESISTANT FILM, PROCESS FOR PRODUCING THE SAME, SURFACE CURED RESIST PATTERN, PROCESS FOR PRODUCING THE SAME, SEMICONDUCTOR DEVICE AND PROCESS FOR PRODUCING THE SAME
摘要
申请公布号
EP1598858(A4)
申请公布日期
2010.09.08
申请号
EP20030707174
申请日期
2003.02.28
申请人
FUJITSU LIMITED
发明人
NOZAKI, KOJI;TAKEDA, MASAYUKI
分类号
H01L21/3065;B44C1/22;G03F7/26;G03F7/40;H01L21/027;H01L21/8247
主分类号
H01L21/3065
代理机构
代理人
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