发明名称 |
Substrate processing apparatus and substrate processing method |
摘要 |
A substrate processing apparatus according to the present invention comprises a substrate holding mechanism for holding a substrate and rotating the held substrate; a process liquid supply mechanism for supplying a process liquid to the substrate; a process liquid acquisition section arranged so as to enclose the substrate holding mechanism and having an acquisition port for acquiring the process liquid scattered by the rotation of the substrate; a movement mechanism for changing a relative position between the process liquid acquisition section and the substrate held by the substrate holding mechanism; and a control mechanism for controlling, when the process liquid scattered by the rotation of the substrate is acquired in the acquisition port, a relative position between the substrate and the acquisition port such that the scattered process liquid is acquired in the acquisition port on the basis of predetermined substrate process condition.
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申请公布号 |
US7789972(B2) |
申请公布日期 |
2010.09.07 |
申请号 |
US20080336724 |
申请日期 |
2008.12.17 |
申请人 |
DAINIPPON SCREEN MFG. CO., LTD. |
发明人 |
EDAMOTO NOBUO |
分类号 |
B08B7/00;B04B7/08;B04B11/06 |
主分类号 |
B08B7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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