发明名称 |
SUBSTRATES AND METHODS OF USING THOSE SUBSTRATES |
摘要 |
PURPOSE: Substrates and method for using the same are provided to eliminate contaminants on the lowest surface of an immersion hood by moving the immersion hood toward a cleaning substrate. CONSTITUTION: A light illuminating system(IL) conditions radiation beams. A supporting structure(MT) supports a patterning device(MA). The supporting structure is connected with a first location setting device(PM) which accurately locates the pattern device. A substrate table(WT) is connected with a second location setting device(PW) which accurate locates a substrate(W). A projecting system(PL) images pattern in the radiation beams toward the target part(C) on the substrate.
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申请公布号 |
KR20100098478(A) |
申请公布日期 |
2010.09.07 |
申请号 |
KR20100067433 |
申请日期 |
2010.07.13 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS;BOUCHOMS IGOR PETRUS MARIA;BRULS RICHARD JOSEPH;JANSEN HANS;LEENDERS MARTINUS HENDRIKUS ANTONIUS;WANTEN PETER FRANCISCUS;VAN DER HEIJDEN MARCUS THEODOOR WILHELMUS;VAN DER DONCK JACQUES COR JOHAN;VAN DEN BOGAARD FREDERIK JOHANNES;GROENEWOLD JAN;VAN DER GRAAF SANDRA;ZOLDESI CARMEN JULIA |
分类号 |
H01L21/302;H01L21/027;H01L21/304 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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