发明名称 SUBSTRATES AND METHODS OF USING THOSE SUBSTRATES
摘要 PURPOSE: Substrates and method for using the same are provided to eliminate contaminants on the lowest surface of an immersion hood by moving the immersion hood toward a cleaning substrate. CONSTITUTION: A light illuminating system(IL) conditions radiation beams. A supporting structure(MT) supports a patterning device(MA). The supporting structure is connected with a first location setting device(PM) which accurately locates the pattern device. A substrate table(WT) is connected with a second location setting device(PW) which accurate locates a substrate(W). A projecting system(PL) images pattern in the radiation beams toward the target part(C) on the substrate.
申请公布号 KR20100098478(A) 申请公布日期 2010.09.07
申请号 KR20100067433 申请日期 2010.07.13
申请人 ASML NETHERLANDS B.V. 发明人 DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS;BOUCHOMS IGOR PETRUS MARIA;BRULS RICHARD JOSEPH;JANSEN HANS;LEENDERS MARTINUS HENDRIKUS ANTONIUS;WANTEN PETER FRANCISCUS;VAN DER HEIJDEN MARCUS THEODOOR WILHELMUS;VAN DER DONCK JACQUES COR JOHAN;VAN DEN BOGAARD FREDERIK JOHANNES;GROENEWOLD JAN;VAN DER GRAAF SANDRA;ZOLDESI CARMEN JULIA
分类号 H01L21/302;H01L21/027;H01L21/304 主分类号 H01L21/302
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