发明名称 Approach to high temperature wafer processing
摘要 At temperatures near, and above, 385° C., gold can diffuse into silicon and into some contact materials. Gold, however, is an excellent material because it is corrosion resistant, electrically conductive, and highly reliable. Using an adhesion layer and removing gold from the contact area above and around a contact allows a Micro-Electro-Mechanical Systems device or semiconductor to be subjected to temperatures above 385° C. without risking gold diffusion. Removing the risk of gold diffusion allows further elevated temperature processing. Bonding a device substrate to a carrier substrate can be an elevated temperature process.
申请公布号 US7791200(B2) 申请公布日期 2010.09.07
申请号 US20080055823 申请日期 2008.03.26
申请人 HONEYWELL INTERNATIONAL INC. 发明人 DAVIS RICHARD A.
分类号 H01L21/46;H01L23/485 主分类号 H01L21/46
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