发明名称 |
ILLUMINATION SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD OF FORMING AN ILLUMINATION MODE. |
摘要 |
<p>An illumination system of a lithographic apparatus includes a plurality of reflective elements arranged to receive radiation from a radiation source, the reflective elements being movable between different orientations. In the different orientations, the reflective elements direct radiation towards different locations at a reflective component in a pupil plane of the illumination system, thereby forming different illumination modes. Each reflective element is moveable between a first orientation, which directs radiation towards a first location the pupil plane, and a second orientation, which directs radiation towards a second location in the pupil plane. The first orientation and the second orientation of the reflective element are defined by end stops.</p> |
申请公布号 |
NL2004303(A) |
申请公布日期 |
2010.09.06 |
申请号 |
NL20102004303 |
申请日期 |
2010.02.25 |
申请人 |
ASML NETHERLANDS B.V., |
发明人 |
LOOPSTRA, ERIK;INGEN SCHENAU, KOEN;SCHOOT, JAN;WAGNER, CHRISTIAN;VRIES, GOSSE |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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