| 摘要 |
<p>PURPOSE: An exposure mask and a forming method for a semiconductor device using the same are provided to improve the reliability of a semiconductor by improving mask error enhancement factor. CONSTITUTION: A mask(S200) comprises a main contact hole pattern(100), a dummy contact hole pattern(102), and a secondary contact hole pattern(104). The secondary contact hole pattern is formed near the main contact hole pattern and the dummy contact hole pattern. The secondary contact hole pattern improves the process margin of the main contact hole pattern.</p> |
