| 摘要 |
<P>PROBLEM TO BE SOLVED: To manufacture, with proper productivity, a mask type ND filter having a plurality of absorption-type multilayer films which have superior transmitting property and reflection property, as well as superior patterning accuracy. Ž<P>SOLUTION: There is provided a method of manufacturing a mask-type ND filter having a resin film substrate 31 and having a plurality of absorption-type multilayer films 30, which are installed with spaces apart on both sides of the resin film substrate. The method is such that for the absorption-type multilayer films uniformly formed on both sides entirely of the resin film substrate 31, a sand blasting (including shot blasting) process is performed to shave off a part of the absorption-type multilayer film 30 and that a plurality of absorption-type multilayer films are formed, separated by gaps, on both sides of the resin film substrate. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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