| 发明名称 |
Mechanism for Forming a Remote Delta Doping Layer of a Quantum Well Structure |
| 摘要 |
A method of fabricating a quantum well device includes forming a diffusion barrier on sides of a delta layer of a quantum well to confine dopants to the quantum well.
|
| 申请公布号 |
US2010219396(A1) |
申请公布日期 |
2010.09.02 |
| 申请号 |
US20100715034 |
申请日期 |
2010.03.01 |
| 申请人 |
JIN BEEN-YIH;KAVALIEROS JACK T;DATTA SUMAN;MAJUMDAR AMLAN;CHAU ROBERT S |
发明人 |
JIN BEEN-YIH;KAVALIEROS JACK T.;DATTA SUMAN;MAJUMDAR AMLAN;CHAU ROBERT S. |
| 分类号 |
H01L29/12;H01L21/20 |
主分类号 |
H01L29/12 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
