发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To form a switch element having a resistance changing layer which changes a resistance value by a history of an applied electric field in multilayered wiring, and to restrain the wiring or a surface of the resistance changing layer from being damaged. SOLUTION: This semiconductor device includes: a first wiring layer 12; a second wiring layer 16; and a switch via 35. The first wiring layer 12 has first wiring 32, and the second wiring layer 16 has second wiring 39. The switch via 35 connects the first wiring 32 with the second wiring 39. The switch via 35 has the switch element having a resistance changing layer 33 at least in the bottom. The resistance changing layer 33 changes a resistance value in response to the history of the electric field applied thereto. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010192605(A) 申请公布日期 2010.09.02
申请号 JP20090034117 申请日期 2009.02.17
申请人 RENESAS ELECTRONICS CORP 发明人 INOUE HISAYA;HAYASHI YOSHIHIRO;KANEKO TAKAAKI
分类号 H01L21/82;H01L21/768;H01L23/522;H01L45/00;H01L49/00 主分类号 H01L21/82
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