发明名称 SUBSTRATE CONVEYING DEVICE AND SUBSTRATE PROCESSING SYSTEM
摘要 <P>PROBLEM TO BE SOLVED: To improve the yield of a product manufactured by a processing system for a substrate by suppressing sticking of particles on the substrate when the substrate is conveyed. Ž<P>SOLUTION: A substrate conveying device includes a substrate holding part 91 for holding the substrate and a lifting mechanism 93 for lifting and lowering the substrate holding part 91 in a vertical direction. On a substrate holding surface 91b of the substrate holding part 91, a plurality of gas jetting holes 100 for jetting a predetermined gas upward are formed. A driving source for the lifting mechanism is a linear motor. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010192685(A) 申请公布日期 2010.09.02
申请号 JP20090035586 申请日期 2009.02.18
申请人 TOKYO ELECTRON LTD 发明人 ASAKAWA YOSHITAKA;KANEKO TOMOHIRO
分类号 H01L21/677;B65G49/07 主分类号 H01L21/677
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