发明名称 SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE TRANSFER METHOD
摘要 PROBLEM TO BE SOLVED: To quickly and highly precisely transfer a substrate to a predetermined location with respect to a mount table in a processing chamber while simplifying the structure of a substrate processing system. SOLUTION: The substrate processing system includes a controller 100 that transfers the substrate by using a transfer apparatus 32 or controls processing of the substrate in a processing apparatus 23. The recipe setter 101 of the controller 100 sets a processing recipe. A memory 102 stores the initial reference location of a transfer arm, a first correlation between the processing recipe and the sidewall temperature of a processing chamber, and a second correlation between the sidewall temperature of the processing chamber and the corrected value of a reference location. A correction section 103 corrects the reference location of the transfer arm on the basis of the processing recipe set in the recipe setter 101 and the initial reference location, the first correlation, and the second correlation stored in the memory 102. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010192571(A) 申请公布日期 2010.09.02
申请号 JP20090033776 申请日期 2009.02.17
申请人 TOKYO ELECTRON LTD 发明人 OKA HIROKI;NARISHIMA MASARU
分类号 H01L21/677;H01L21/02;H01L21/68 主分类号 H01L21/677
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