发明名称 ROTATABLE PLATE AND HEATING/COOLING ELEMENT IN PROXIMITY THERETO
摘要 An apparatus for selectively heating/cooling one or more substrates and establishing an approximately uniform temperature in the one or more substrates during a heating or cooling event is described. In one embodiment, the apparatus comprises a rotatable hot/cold plate onto which the one or more substrates are placed and a heating/cooling element disposed in close proximity to the rotatable hot/cold plate for selectively elevating/lowering the temperature of the one or more substrates.
申请公布号 US2010219175(A1) 申请公布日期 2010.09.02
申请号 US20100686276 申请日期 2010.01.12
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 PENG JUI-CHUN;CHUNG JACKY;LIU HENG-HSIN;LIN CHUN-HUNG
分类号 H05B3/68 主分类号 H05B3/68
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