发明名称 |
ROTATABLE PLATE AND HEATING/COOLING ELEMENT IN PROXIMITY THERETO |
摘要 |
An apparatus for selectively heating/cooling one or more substrates and establishing an approximately uniform temperature in the one or more substrates during a heating or cooling event is described. In one embodiment, the apparatus comprises a rotatable hot/cold plate onto which the one or more substrates are placed and a heating/cooling element disposed in close proximity to the rotatable hot/cold plate for selectively elevating/lowering the temperature of the one or more substrates.
|
申请公布号 |
US2010219175(A1) |
申请公布日期 |
2010.09.02 |
申请号 |
US20100686276 |
申请日期 |
2010.01.12 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
PENG JUI-CHUN;CHUNG JACKY;LIU HENG-HSIN;LIN CHUN-HUNG |
分类号 |
H05B3/68 |
主分类号 |
H05B3/68 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|