发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SAME
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a semiconductor device having a memory circuit which is highly adaptive to a logic process and has high tolerance of noise, and a method of manufacturing the same. <P>SOLUTION: The semiconductor device includes a semiconductor substrate where a memory cell array comprising a plurality of memory cells arranged in a matrix along a first and a second direction and a plurality of sense amplifiers including first and second sense amplifiers are formed, the memory cells each comprising a transistor having an insulating gate electrode, and a bit contact region and the other source/drain region formed at both sides thereof, and a capacitor connected to the other source/drain region. The semiconductor device includes, above the memory cell array, a plurality of bit lines extending along the first direction, connected to a plurality of bit line contact regions, and arranged successively in the second direction. A first pair of bit lines connected to a first sense amplifier are formed of a first wiring layer, and a second pair of bit lines connected to a second sense amplifier are formed of a second wiring layer different from the first wiring layer. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2010192816(A) 申请公布日期 2010.09.02
申请号 JP20090037904 申请日期 2009.02.20
申请人 FUJITSU SEMICONDUCTOR LTD 发明人 OGAWA HIROYUKI;TOMITA HIROYOSHI;TAKITA MASAHITO
分类号 H01L21/8242;H01L27/10;H01L27/108 主分类号 H01L21/8242
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