| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a solar cell by utilizing an inductively coupled plasma enhanced chemical vapor deposition method. <P>SOLUTION: In manufacturing a solar cell including: a first electrode; a first frame layer; an intrinsic layer; a second frame layer; and a second electrode, an inductively coupled plasma enhanced chemical vapor deposition device using a mixed gas containing a hydrogen (H<SB>2</SB>) gas and a silane (SiH<SB>4</SB>) gas is used, and the manufacturing method includes an intrinsic layer forming step of forming the intrinsic layer consisting of a hydride amorphous silicon thin film, wherein the mixed gas has the ratio (H<SB>2</SB>/SiH<SB>4</SB>) of the hydrogen gas and the silane gas to the hydrogen gas is 8-10. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
