| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a mark arrangement inspection method capable of reducing errors in arranging marks to be arranged on scribe lines such as an alignment mark and a measurement mark in designing scribe line data. <P>SOLUTION: The method includes: a step of creating mark seed data having vector information for detecting rotation of a predetermined angle unit or mirror inversion of a mark, an inspection mark that is not drawn on a mask, and mark data; a step of creating mask data in which the mark seed data is arranged on the scribe line of the mask; a step of calculating coordinates of the inspection mark from a reference position set to the mask data for each mark seed data in the mask data, and detecting the arrangement state with respect to the reference position of the inspection mark using the calculated coordinates and the vector information of the inspection mark; and a step of comparing the arrangement state of the inspection mark with an arrangement check rule that specifies the arrangement state of the mark seed data in the mask, and determining whether the mark seed data is correctly arranged on the scribe line. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
