| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing an active element substrate exhibiting high aperture ratio and high transmittance, by which parasitic capacitance can be suppressed without increasing man hours. SOLUTION: The method includes a step of forming transparent insulating layers 9 and 10 on a pixel TFT 7 and signal wiring, the transparent insulating layers having contact holes 9a and 10a respectively. The step includes: a step of forming the first insulating layer 9 so as to cover the pixel TFT7 and signal wiring, the first insulating layer being not photoconductive; a step of forming the second insulating layer 10 so as to cover the first insulating layer 9, the second insulating layer being photoconductive; a step of patterning the second insulating layer 10 by exposure and development; and a step of etching the first insulating layer 9 with the second insulating layer 10 as a mask. COPYRIGHT: (C)2010,JPO&INPIT |
