发明名称 |
SYSTEMS AND METHODS FOR INSITU LENS CLEANING IN IMMERSION LITHOGRAPHY |
摘要 |
PURPOSE: A system and a method for cleaning a lens in-situ in immersion lithography is provided to prevent the damages to final lens elements and to efficiently performing an in-situ cleaning process of final lens elements without removing the leans and repositioning the lens. CONSTITUTION: An apparatus for immersion lithography comprises: an energy source(110); a projection optical system(130); a stage(160) which a substrate(150) is arranged in and moves the substrate; a showerhead including an immersion liquid feed device and an immersion liquid discharge device; and a cleaning device which cleans a part of the projection optical system contacting immersed liquid(140) through cleaning gas. The cleaning device includes a UV source.
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申请公布号 |
KR20100097083(A) |
申请公布日期 |
2010.09.02 |
申请号 |
KR20100070881 |
申请日期 |
2010.07.22 |
申请人 |
ASML HOLDING N.V. |
发明人 |
SEWELL HARRY;MARKOYA LOUIS JOHN |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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