发明名称 MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a technology for highly accurately measuring a surface shape of a surface to be measured with superior reproducibility by reducing effects caused by variations in light quantity of light from a light source. <P>SOLUTION: A measurement apparatus measures a surface shape of a surface to be measured. The apparatus includes: an optical system configured to split light from a light source into measurement light and reference light, make the measurement light incident to the surface of the surface to be measured, and make the reference light incident to a reference surface; a detection unit configured to detect light intensity of the measurement light reflected by the surface of the surface to be measured, light intensity of the reference light reflected by the reference surface, and an interference pattern formed between the measurement light reflected by the surface of the surface to be measured and the reference light reflected by the reference surface; and a processing unit configured to calculate the surface shape of the surface to be measured on the basis of an interference signal of the interference pattern detected by the detection unit. The processing unit reduces effects caused by variations in light quantity of light from the light source included in the interference signal of the interference pattern detected by the detection unit on the basis of the light intensity of the measurement light and the light intensity of the reference light respectively detected by the detection unit so as to calculate the surface shape of the surface to be measured. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010192470(A) 申请公布日期 2010.09.02
申请号 JP20090031963 申请日期 2009.02.13
申请人 CANON INC 发明人 MATSUDA HIDEKI
分类号 H01L21/027;G01B11/24;G01M11/00;G03F7/20 主分类号 H01L21/027
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