| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a negative radiation-sensitive composition suitable for forming a cured pattern that constitutes an interlayer insulating film low in dielectric constant, and to provide a method for forming a cured pattern using the composition, and a cured pattern obtained by the method for forming a cured pattern. <P>SOLUTION: The negative radiation-sensitive composition contains: [A] a polysiloxane having a silanol group; [B] a polymer having a structural unit expressed by general formula (1) and having a weight average molecular weight of 1,000 to 100,000; and [C] a solvent. <P>COPYRIGHT: (C)2010,JPO&INPIT |
