| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for forming a irregular shape, for stably and accurately forming a fine irregular shape on a photoresist layer or on various types of substrates by using a photoresist containing a photo-reactive component that is made soluble by exposure and reaction with water. <P>SOLUTION: The method for forming the irregular shapes 20, 30 includes: solidifying a photoresist on a substrate 11, the photoresist containing a photo-reactive component that is made soluble by exposure and reaction with water so as to form a photoresist layer 13 having a thickness of 5 μm or more(S20), and exposing and developing the photoresist layer 13. After the photoresist layer 13 is formed, the photoresist layer 13 is held for a predetermined time in a humidity-controlled environment maintaining predetermined temperature and predetermined humidity, and then exposed. <P>COPYRIGHT: (C)2010,JPO&INPIT |
