| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of processing a semiconductor substrate that can easily increase the surface area of a surface to be processed of the semiconductor substrate. SOLUTION: The method of processing the semiconductor substrate processes the surface of the semiconductor substrate 10 constituting a solar cell, includes a semiconductor substrate holding process of holding the semiconductor substrate on a holding surface of a chuck table 62 with the surface to be processed up, a grinding wheel positioning process of setting a grinding surface of a grindstone constituting a grinding wheel of a grinding means at a grinding position a predetermined amount below the surface to be processed of the semiconductor substrate held on the chuck table, and a grinding process of forming striped unevenness on the surface to be processed of the semiconductor substrate by causing a juddering phenomenon by moving the chuck table at a predetermined processing feed speed in a state wherein the grinding wheel is rotated and causing the grindstone to act on the semiconductor substrate held on the chuck table from one end to the other end of the semiconductor substrate. COPYRIGHT: (C)2010,JPO&INPIT
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