发明名称 INSPECTION DEVICE, LITHOGRAPHIC APPARATUS, LITHOGRAPHY PROCESSING CELL, AND INSPECTION METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a technique for accurately finding characteristics of a substrate while preventing order of diffraction from being overlapped. <P>SOLUTION: A radiation beam having an illumination profile with four quadrants is used for angular resolved spectrometry. First and third quadrants are illuminated, meanwhile, second and fourth quadrants are not illuminated. Therefore, the resultant pupil surface is divided into four quadrants, only a zero-order diffraction pattern appears on the first and third quadrants, and only a first-order diffraction pattern appears on the second and third quadrants. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010192894(A) 申请公布日期 2010.09.02
申请号 JP20100022659 申请日期 2010.02.04
申请人 ASML NETHERLANDS BV 发明人 CRAMER HUGO AUGUSTINUS JOSEPH;MARIE KIERS ANTOINE GASTON;PELLEMANS HENRICUS PETRUS MARIA
分类号 H01L21/66;G01N21/956;H01L21/027 主分类号 H01L21/66
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