发明名称 |
INSPECTION DEVICE, LITHOGRAPHIC APPARATUS, LITHOGRAPHY PROCESSING CELL, AND INSPECTION METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technique for accurately finding characteristics of a substrate while preventing order of diffraction from being overlapped. <P>SOLUTION: A radiation beam having an illumination profile with four quadrants is used for angular resolved spectrometry. First and third quadrants are illuminated, meanwhile, second and fourth quadrants are not illuminated. Therefore, the resultant pupil surface is divided into four quadrants, only a zero-order diffraction pattern appears on the first and third quadrants, and only a first-order diffraction pattern appears on the second and third quadrants. <P>COPYRIGHT: (C)2010,JPO&INPIT |
申请公布号 |
JP2010192894(A) |
申请公布日期 |
2010.09.02 |
申请号 |
JP20100022659 |
申请日期 |
2010.02.04 |
申请人 |
ASML NETHERLANDS BV |
发明人 |
CRAMER HUGO AUGUSTINUS JOSEPH;MARIE KIERS ANTOINE GASTON;PELLEMANS HENRICUS PETRUS MARIA |
分类号 |
H01L21/66;G01N21/956;H01L21/027 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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