| 摘要 |
<P>PROBLEM TO BE SOLVED: To uniformize intensity distribution of light emitted from a laser source and make the light incident onto a light intake of an exposure apparatus body. <P>SOLUTION: The unit (1) for uniformization is arranged at an immediate back of a light output of the laser source to uniformize the intensity distribution of light emitted from the light output and make the light incident onto the light intake of the exposure apparatus body. The unit for uniformization includes a wavefront dividing device (1a) for wavefront-dividing a light flux incident from the laser source into a plurality of light fluxes, and relay optical system (1b) for superimposing the plurality of light fluxes, which are wavefront-divided by the wavefront dividing device, at the light intake of the exposure apparatus body. <P>COPYRIGHT: (C)2010,JPO&INPIT |
