| 摘要 |
PURPOSE: A dual dielectric MIM(Metal-Insulation-Metal) capacitor and a manufacturing method thereof are provided to reduce complexity and process steps for forming a capacitor by integrating the capacitor with different function regions. CONSTITUTION: A chip(10) includes a first area(100) and a second area(200). A first MIM capacitor(102) is formed on the first area and includes a first bottom electrode(122), a first top electrode(124), and a capacitor insulator(130) between the first bottom electrode and the first top electrode. A second MIM capacitor(202) is formed on the second area and includes a second bottom electrode(222), a second top electrode(224), and a second capacitor insulator(230) between the second top electrode and the second bottom electrode. |
