发明名称 PHOTOSENSITIVE RESIN COMPOSITION, AND PHOTOSENSITIVE ELEMENT, RESIST PATTERN FORMATION METHOD AND PRINTED CIRCUIT BOARD PRODUCTION METHOD EACH UTILIZING SAME
摘要 <p>Disclosed is a photosensitive resin composition comprising (A) a binder polymer, (B) a photopolymerizable compound, (C) a photopolymerization initiator and (D) a sensitizing dye, wherein the binder polymer (A) has a constituent unit derived from (meth)acrylic acid and a constituent unit derived from (meth)acrylic acid benzyl ester or a (meth)acrylic acid benzyl ester derivative, the photopolymerizable compound (B) comprises a compound having one ethylenically unsaturated bond, and the sensitizing dye (D) comprises a compound represented by general formula (1). In formula (1), R1 and R2 independently represent a substituted or unsubstituted phenyl, thienyl or furyl group; R3 represents an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, or an alkylester group having 1 to 10 carbon atoms; a and b independently represent an integer of 0 to 2; and m represents an integer of 0 to 5.</p>
申请公布号 WO2010098183(A1) 申请公布日期 2010.09.02
申请号 WO2010JP51494 申请日期 2010.02.03
申请人 HITACHI CHEMICAL COMPANY, LTD.;MIYASAKA MASAHIRO;MURAMATSU YUKIKO 发明人 MIYASAKA MASAHIRO;MURAMATSU YUKIKO
分类号 G03F7/031;C08F2/50;C08F220/06;C08F290/06;G03F7/004;G03F7/027;G03F7/033;G03F7/40;H05K3/00 主分类号 G03F7/031
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