发明名称 METHOD FOR MANUFACTURING MICROLENS SUBSTRATE, MICROLENS SUBSTRATE, ELECTROOPTICAL DEVICE, AND ELECTRONIC DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a microlens substrate improving display performance by the improvement of contrast, reduction of in-plane luminance unevenness, or the like while the improvement of yield can be expected, and to provide the microlens substrate, an electrooptical device and an electronic device. <P>SOLUTION: The method for manufacturing the microlens substrate includes processes for forming a recess 20 shaped to correspond to a microlens, at one surface of a first substrate 10, applying water repellent treatment to the surface of a second substrate 32 with conductivity, forming a transparent conductive film 18 on the second substrate 32 to which water repellent treatment is applied, forming a shading film 16 on the transparent conductive film 18, forming an insulating film 14 on the shading film 16 and transparent conductive film 18, applying resin 36 to cover the surface of the first substrate 10, forming a laminate of the first substrate 10 and second substrate 32, curing the resin 36, and stripping the second substrate 32 from the transparent conductive film 18. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010191033(A) 申请公布日期 2010.09.02
申请号 JP20090033596 申请日期 2009.02.17
申请人 SEIKO EPSON CORP 发明人 SUNAKAWA TSUYOSHI
分类号 G02B3/00;G02F1/1335 主分类号 G02B3/00
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