| 发明名称 |
FIC Installation and Method for Operating a FIC Installation in the Pressure Range Above Atmospheric Pressure |
| 摘要 |
A method of Fluoride Ion Cleaning (FIC) of a component is provided. A FIC installation includes a reaction chamber and a reactive gas or a reactive gas mixture. A pressure of the reactive gas or the reactive gas mixture in the reaction chamber is set at least occasionally above atmospheric pressure, wherein the pressure in the reaction chamber is periodically lowered and raised.
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| 申请公布号 |
US2010218787(A1) |
申请公布日期 |
2010.09.02 |
| 申请号 |
US20100681665 |
申请日期 |
2010.04.05 |
| 申请人 |
LADRU FRANCIS-JURJEN;NORDALM ALEXANDER;OTT MICHAEL |
发明人 |
LADRU FRANCIS-JURJEN;NORDALM ALEXANDER;OTT MICHAEL |
| 分类号 |
C23G1/00 |
主分类号 |
C23G1/00 |
| 代理机构 |
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