| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide: a device for manufacturing a semiconductor device, the device suppressing deviation of a dimension of a pattern to be formed even when an exposure device having a plurality of exposure stages is used; a method of controlling the same; and a program for controlling the same. <P>SOLUTION: The device for manufacturing a semiconductor device includes: a stage information acquisition part for acquiring, as stage information, information for specifying an exposure stage used in exposing a object wafer to be heated from an exposure unit including a plurality of exposure stages each used for mounting a wafer thereon; and a temperature setting part for setting the heating temperature of a heating device for heating the object wafer. The temperature setting part sets the heating temperature individually for each of the plurality of exposure stages based on the stage information. <P>COPYRIGHT: (C)2010,JPO&INPIT |
