| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a thin film transistor display panel which reduces defects in a pattern, and a negative photoresist composition used for it. <P>SOLUTION: The manufacturing method includes the step of forming a conductive film containing a conductive material on a substrate, the step of forming an etching pattern composed of the negative photoresist composition on the conductive film, and the step of etching the conductive film by utilizing the etching pattern as an etching mask, and forming a conductive film pattern. The negative photoresist composition includes a novolac resin 10-50 pts.wt. containing a hydroxyl group having the solubility in an alkaline developing solution, a first photoacid generation agent (a specific configuration sulfonyloxy imide compound) 0.5-10 pts.wt., a second photoacid generation agent (a specific configuration sulfonyloxy imide compound having a configuration different from the first photoacid generation agent) 0.5-10 pts.wt., a cross-linking agent 1-20 pts.wt., and a solvent 10-90 pts.wt. <P>COPYRIGHT: (C)2010,JPO&INPIT |
