| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a light source device for measuring a pressure value in the device body while reducing a change in exposure properties, and provide an exposure device and a method for manufacturing the device. <P>SOLUTION: An exposure device 11 includes a first chamber 13 with the interior set at a vacuum atmosphere, an illumination optical system 15 arranged in the first chamber 13 to illuminate a reticle R with exposure light EL that is output from a light source device 12, a projection optical system 17 arranged in the first chamber 13 to project the image of a predetermined pattern to a wafer W, a vacuum evacuation device 14 for exhausting the gas in the first chamber 13 outside, and a measuring device 43 having a detecting section 44 arranged in the downstream side in the flow direction of the gas on the basis of the drive of the vacuum evacuation device 14 to measure the pressure value in the first chamber 13 on the basis of the detection information detected by the detecting section 44. <P>COPYRIGHT: (C)2010,JPO&INPIT |
