| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which contains no such a chromium compound as chromium naphthenate and has the heat stability and development control width equal to or more than photosensitive resin compositions a chromium compound as a synthetic catalyst. <P>SOLUTION: This photosensitive resin composition contains (A) a photosensitive resin which is obtained by reacting a polyfunctional epoxy compound and an unsaturated monobasic acid and additionally by reacting a polybasic acid anhydride in the presence of a trivalent organic phosphorus compound and at least one kind of zirconium naphthenate of or zirconium octylate of, on the basis of the mass, at least four times the above trivalent organic phosphorus compound, (B) an epoxy resin, (C) a photopolymerization initiator and (D) a reactive diluent. <P>COPYRIGHT: (C)2010,JPO&INPIT |
