| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for reducing pattern distortions in imprinting layers by greatly reducing gas pockets present in the layer of viscous liquid deposited on a substrate. <P>SOLUTION: The method includes a step of varying transport of gases disposed proximate to the viscous liquid. Specifically, the atmosphere proximate to the substrate wherein a pattern is to be recorded is saturated with gases that are either highly soluble, highly diffusive, or both with respect to the viscous liquid being deposited. Additionally, or in lieu of saturating the atmosphere, the pressure of the atmosphere can be reduced. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
